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1.
Micromachines (Basel) ; 15(1)2023 Dec 24.
Artigo em Inglês | MEDLINE | ID: mdl-38258158

RESUMO

This paper presents a home-built projection lithographer designed to transfer the image from a DLP (digital light processing) projector MEMS matrix onto the microscope objective's field of view, where a photoresist-covered substrate is placed. The photoresist is exposed using blue light with a wavelength of 450 nm. To calibrate the device and adjust focal lengths, we utilize a red light that does not affect the photoresist. The substrate is located on a movable platform, allowing the exposure field to be shifted, enabling the exposure of designs with lateral sizes of 1 × 1 cm2 at a resolution of a few micrometers. Our setup showcases a 2 µm resolution for the single frame 200 × 100 µm2, and a 5 µm resolution for 1 × 1 cm2 with field stitching. The exposure speed, approximately 1 mm2/100 s, proves to be sufficient for a variety of laboratory prototyping needs. This system offers a significant advantage due to its utilization of easily accessible and budget-friendly components, thereby enhancing its accessibility for a broader user base. The exposure speed and resolution meet the requirements for laboratory prototyping in the fields of 2D materials, quantum optics, superconducting microelectronics, microfluidics, and biology.

2.
Micromachines (Basel) ; 12(8)2021 Jul 21.
Artigo em Inglês | MEDLINE | ID: mdl-34442473

RESUMO

The fast and precise fabrication of micro-devices based on single flakes of novel 2D materials and stacked heterostructures is vital for exploration of novel functionalities. In this paper, we demonstrate a fast high-resolution contact mask lithography through a simple upgrade of metallographic optical microscope. Suggested kit for the micromask lithography is compact and easily compatible with a glove box, thus being suitable for a wide range of air-unstable materials. The shadow masks could be either ordered commercially or fabricated in a laboratory using a beam lithography. The processes of the mask alignment and the resist exposure take a few minutes and provide a micrometer resolution. With the total price of the kit components around USD 200, our approach would be convenient for laboratories with the limited access to commercial lithographic systems.

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